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Appl. Phys. Lett. 97, 096101 (2010); http://dx.doi.org/10.1063/1.3475395 (1 page)

Comment on “Depletion width measurement in an organic Schottky contact using a metal-semiconductor field-effect transistor” [ Appl. Phys. Lett. 91, 083513 (2007) ]

Yow-Jon Lin

Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan

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(Received 10 January 2010; accepted 11 July 2010; published online 30 August 2010)

Abstract unavailable.

EDITORIALLY RELATED

    Related Articles

  1. Response to “Comment on `Depletion width measurement in an organic Schottky contact using a metal-semiconductor field-effect transistor' ” [Appl. Phys. Lett. 97, 096101 (2010)]
    Arash Takshi et al.
    Appl. Phys. Lett. 97, 096102 (2010)APPLAB000097000009096102000001
  2. Depletion width measurement in an organic Schottky contact using a metal-semiconductor field-effect transistor
    Arash Takshi et al.
    Appl. Phys. Lett. 91, 083513 (2007)APPLAB000091000008083513000001

KEYWORDS and PACS

PACS

  • 73.30.+y

    Surface double layers, Schottky barriers, and work functions

  • 85.30.Tv

    Field effect devices

  • 73.40.Ns

    Metal-nonmetal contacts

  • 73.20.Fz

    Weak or Anderson localization

  • 71.23.An

    Theories and models; localized states

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

  1. A. Takshi, A. Dimopoulos, and J. D. Madden, Appl. Phys. Lett. 91, 083513 (2007)APPLAB000091000008083513000001. [ISI]
  2. I. H. Campbell, T. W. Hagler, D. L. Smith, and J. P. Ferraris, Phys. Rev. Lett. 76, 1900 (1996). [MEDLINE]
  3. M. Matsumura, Y. Jinde, T. Akai, and T. Kimura, Jpn. J. Appl. Phys., Part 1 35, 5735 (1996). [Inspec]
  4. S. H. Kim, J. Jang, and J. Y. Lee, Appl. Phys. Lett. 89, 253501 (2006)APPLAB000089000025253501000001.
  5. C. Ganzorig, M. Sakomura, K. Ueda, and M. Fujihira, Appl. Phys. Lett. 89, 263501 (2006)APPLAB000089000026263501000001.


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