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Appl. Phys. Lett. 98, 012903 (2011); http://dx.doi.org/10.1063/1.3532110 (3 pages)

Enhanced critical temperature in epitaxial ferroelectric Pb(Zr0.2Ti0.8)O3 thin films on silicon

A. Sambri1, S. Gariglio1, A. Torres Pardo1, J.-M. Triscone1, O. Stéphan2, J. W. Reiner3, and C. H. Ahn3

1Department of Condensed Matter Physics (DPMC), University of Geneva, 24 quai Ernest-Ansermet, 1211 Geneva 4, Switzerland
2Laboratoire de Physique des Solides, Université Paris-Sud, CNRS-UMR 8502, Orsay 91405, France
3Department of Applied Physics, Yale University, P.O. Box 208284, New Haven, Connecticut 06520-8284, USA

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(Received 26 July 2010; accepted 3 December 2010; published online 7 January 2011)

The structural and electrical properties of epitaxial Pb(Zr0.2Ti0.8)O3 thin films grown on 2 in. (001) silicon wafers were investigated. Using x-ray diffraction, the lattice behavior of the heterostructure has been studied as a function of temperature, suggesting a 250 °C increase of the Pb(Zr0.2Ti0.8)O3 ferroelectric-paraelectric transition temperature with respect to the bulk value. This significant enhancement of the critical temperature is understood in terms of a two-dimensional clamping effect.

© 2011 American Institute of Physics

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0003-6951 (print)  
1077-3118 (online)

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