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Appl. Phys. Lett. 98, 121108 (2011); http://dx.doi.org/10.1063/1.3565168 (3 pages)

Surface segregation effects of erbium in GaAs growth and their implications for optical devices containing ErAs nanostructures

Adam M. Crook, Hari P. Nair, and Seth R. Bank

The University of Texas at Austin, Microelectronics Research Center, 10100 Burnet Rd. Bldg. 160, Austin, Texas 78758, USA

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(Received 13 December 2010; accepted 14 February 2011; published online 23 March 2011)

We report on the integration of semimetallic ErAs nanoparticles with high optical quality GaAs-based semiconductors, grown by molecular beam epitaxy. Secondary ion mass spectrometry and photoluminescence measurements provide evidence of surface segregation and incorporation of erbium into layers grown with the erbium cell hot, despite the closed erbium source shutter. We establish the existence of a critical areal density of the surface erbium layer, below which the formation of ErAs precipitates is suppressed. Based upon these findings, we demonstrate a method for overgrowing ErAs nanoparticles with III-V layers of high optical quality, using subsurface ErAs nanoparticles as a sink to deplete the surface erbium concentration. This approach provides a path toward realizing optical devices based on plasmonic effects in an epitaxially-compatible semimetal/semiconductor system.

© 2011 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 81.05.Ea

    III-V semiconductors

  • 81.15.Hi

    Molecular, atomic, ion, and chemical beam epitaxy

  • 68.55.ag

    Semiconductors

  • 68.35.Dv

    Composition, segregation; defects and impurities

  • 78.66.Fd

    III-V semiconductors

  • 81.16.-c

    Methods of micro- and nanofabrication and processing

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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