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Appl. Phys. Lett. 98, 121115 (2011); http://dx.doi.org/10.1063/1.3571440 (3 pages)
The effect of trimethylgallium flows in the AlInGaN barrier on optoelectronic characteristics of near ultraviolet light-emitting diodes grown by atmospheric pressure metalorganic vapor phase epitaxy
(Received 14 December 2010; accepted 6 March 2011; published online 24 March 2011)
© 2011 American Institute of Physics
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Y. K. Kuo, J. Y. Chang, M. C. Tsai, and S. H. Yen, Appl. Phys. Lett. 95, 011116 (2009)APPLAB000095000001011116000001.
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