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Appl. Phys. Lett. 98, 121117 (2011); http://dx.doi.org/10.1063/1.3567943 (3 pages)

Improved performance of GaN metal-semiconductor-metal ultraviolet detectors by depositing SiO2 nanoparticles on a GaN surface

Xiaojuan Sun1,2, Dabing Li1, Hong Jiang1, Zhiming Li1, Hang Song1, Yiren Chen1, and Guoqing Miao1

1Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 3888 Dongnanhu Road, Changchun 130033, People's Republic of China
2Graduate School of the Chinese Academy of Sciences, Beijing 100039, People's Republic of China

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(Received 2 January 2011; accepted 28 February 2011; published online 24 March 2011)

GaN metal-semiconductor-metal (MSM) ultraviolet detectors were investigated by depositing different density of SiO2 nanoparticles (SNPs) on the GaN. It was shown that the dark current of the detectors with SNPs was more than one order of magnitude lower than that without SNPs and the peak responsivity was enhanced after deposition of the SNPs. Atomic force microscopy observations indicated that the SNPs usually formed at the termination of screw and mixed dislocations, and further current-voltage measurements showed that the leakage of the Schottky contact for the GaN MSM detector decreased with deposited the SNPs. Moreover, the leakage obeyed the Frenkel–Poole emission model, which meant that the mechanism for improving the performance is the SNPs passivation of the dislocations followed by the reduction in the dark current.

© 2011 American Institute of Physics

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KEYWORDS and PACS

PACS

  • 73.40.Sx

    Metal-semiconductor-metal structures

  • 72.40.+w

    Photoconduction and photovoltaic effects

  • 72.20.Ht

    High-field and nonlinear effects

  • 73.30.+y

    Surface double layers, Schottky barriers, and work functions

  • 85.60.Gz

    Photodetectors (including infrared and CCD detectors)

ARTICLE DATA

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

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