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Applied Physics Letters / Volume 98 / Issue 12 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 98, 121501 (2011); http://dx.doi.org/10.1063/1.3571292 (3 pages)

Theoretical discussion for electron-density distribution in multicusp ion source

Hualin Zhan, Chundong Hu, Yahong Xie, Bin Wu, Jinfang Wang, Lizheng Liang, and Jianglong Wei

Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China

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(Received 4 January 2011; accepted 7 March 2011; published online 24 March 2011)

By introducing some ideas of magnetohydrodynamics (MHD) and kinetic theories, some useful solutions for electron-density distribution in the radial direction in multicusp ion source are obtained. Therefore, some conclusions are made in this perspective: 1, the electron-density distributions in a specific region in the sheath are the same with or without magnetic field; 2, the influence of magnetic field on the electron density obeys exponential law, which should take into account the collision term as well if the magnetic field is strong; 3, the result derived from the Boltzmann equation is qualitatively consistent with some given experimental results.

© 2011 American Institute of Physics

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KEYWORDS and PACS

Keywords

plasma kinetic theory, plasma magnetohydrodynamics, plasma sheaths, plasma simulation, plasma sources, plasma transport processes

PACS

  • 52.25.Dg

    Plasma kinetic equations

  • 52.35.Bj

    Magnetohydrodynamic waves (e.g., Alfven waves)

  • 52.30.Cv

    Magnetohydrodynamics (including electron magnetohydrodynamics)

  • 52.40.Kh

    Plasma sheaths

  • 52.50.Dg

    Plasma sources

  • 52.25.Fi

    Transport properties

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3571292

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
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    C. F. Chan, C. F. Burrell, and W. S. Cooper, J. Appl. Phys. 54, 6119 (1983)JAPIAU000054000011006119000001.

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    R. Limpaecher and K. Mackenzie, Rev. Sci. Instrum. 44, 726 (1973)RSINAK000044000006000726000001.


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