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Appl. Phys. Lett. 98, 023115 (2011); http://dx.doi.org/10.1063/1.3540680 (3 pages)
Embedded voids approach for low defect density in epitaxial GaN films
(Received 31 August 2010; accepted 20 December 2010; published online 14 January 2011)
© 2011 American Institute of Physics
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KEYWORDS and PACS
Keywords
atomic force microscopy, dislocation density, gallium compounds, III-V semiconductors, semiconductor epitaxial layers, transmission electron microscopy, voids (solid), wide band gap semiconductors
PACS
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III-V semiconductors
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Semiconductors
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Atomic force microscopy (AFM)
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Transmission electron microscopy (TEM)
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Microscopic defects (voids, inclusions, etc.)
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Direct observation of dislocations and other defects (etch pits, decoration, electron microscopy, x-ray topography, etc.)
ARTICLE DATA
References
O. H. Nam, M. D. Bremser, T. S. Zheleva, and R. F. Davis, Appl. Phys. Lett. 71, 2638 (1997)APPLAB000071000018002638000001.T. Hino, S. Tomiya, T. Miyajima, K. Yanashima, S. Hashimoto, and M. Ikeda, Appl. Phys. Lett. 76, 3421 (2000)APPLAB000076000023003421000001.
S. K. Hong, T. Yao, B. J. Kim, S. Y. Yoon, and T. I. Kim, Appl. Phys. Lett. 77, 82 (2000)APPLAB000077000001000082000001.
B. Heying, E. J. Tarsa, C. R. Elssas, P. Fini, S. P. DenBaars, and J. S. Speck, J. Appl. Phys. 85, 6470 (1999)JAPIAU000085000009006470000001.
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