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Applied Physics Letters / Volume 98 / Issue 21 / DIELECTRICS AND FERROELECTRICITY

Appl. Phys. Lett. 98, 212901 (2011); http://dx.doi.org/10.1063/1.3593138 (3 pages)

Mapping piezoelectric nonlinearity in the Rayleigh regime using band excitation piezoresponse force microscopy

F. Griggio1, S. Jesse2, A. Kumar2, D. M. Marincel1, D. S. Tinberg1, S. V. Kalinin2, and S. Trolier-McKinstry1

1Department of Materials Science and Engineering, Materials Research Institute, Materials Research Laboratory, Penn State University, University Park, Pennsylvania 16802, USA
2The Center for Nanophase Materials Science and Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA

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(Received 30 March 2011; accepted 29 April 2011; published online 23 May 2011)

Band excitation piezoresponse force microscopy enables local investigation of the nonlinear piezoelectric behavior of ferroelectric thin films. However, the presence of additional nonlinearity associated with the dynamic resonant response of the tip-surface junction can complicate the study of a material’s nonlinearity. Here, the relative importance of the two nonlinearity sources was examined as a function of the excitation function. It was found that in order to minimize the effects of nonlinear tip-surface interactions but achieve good signal to noise level, an optimal excitation function must be used.

© 2011 American Institute of Physics

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KEYWORDS and PACS

Keywords

dielectric resonance, electric domain walls, ferroelectric materials, ferroelectric thin films, lead compounds, piezoelectric materials, piezoelectric thin films

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3593138

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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    F. Griggio and S. Trolier-McKinstry, J. Appl. Phys. 107, 024105 (2010)JAPIAU000107000002024105000001.

    P. Bintachitt, S. Trolier-McKinstry, K. Seal, S. Jesse, and S. V. Kalinin, Appl. Phys. Lett. 94, 042906 (2009)APPLAB000094000004042906000001.


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