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Applied Physics Letters / Volume 98 / Issue 6 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 98, 061502 (2011); http://dx.doi.org/10.1063/1.3551541 (3 pages)

Highly collimated electron beams from double-gate field emitter arrays with large collimation gate apertures

P. Helfenstein1, E. Kirk1, K. Jefimovs2, T. Vogel1, C. Escher3, H.-W. Fink3, and S. Tsujino1

1Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, CH-5232 Villigen-PSI, Switzerland
2Electronics/Metrology/Reliability Laboratory, EMPA, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland
3Physik Institut, University of Zurich, Winterthurerstrasse 190, CH-8057 Zurich, Switzerland

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(Received 4 November 2010; accepted 12 January 2011; published online 9 February 2011)

Electron collimation in field emitter arrays with electron extraction gate and collimation gate electrodes is studied with the goal to develop a high-brightness high current cathode. Using metallic field emitter arrays prepared by the molding method, we fabricated a stacked double-gate device with the two gates differing in diameter by a process utilizing focused-ion beam milling. We measured the field-emission beam characteristics and demonstrated a reduction of the emission angle by a factor of 7.1±0.8 with minimal emission current decrease under collimating conditions, resulting in a current density increase by a factor of 13.9±1.0.

© 2011 American Institute of Physics

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KEYWORDS and PACS

Keywords

cathodes, current density, electron beams, field emitter arrays, focused ion beam technology, milling

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3551541

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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