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Applied Physics Letters / Volume 99 / Issue 25 / NANOSCALE SCIENCE AND DESIGN

Appl. Phys. Lett. 99, 253102 (2011); http://dx.doi.org/10.1063/1.3671084 (3 pages)

High resolution patterning of nanoparticles by evaporative self-assembly enabled by in situ creation and mechanical lift-off of a polymer template

Michael T. Demko1, Sun Choi1, Tarek I. Zohdi2, and Albert P. Pisano1

1Berkeley Sensor & Actuator Center (BSAC), University of California, Berkeley, California 94720, USA
2Department of Mechanical Engineering, University of California, Berkeley, California 94720, USA

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(Received 7 September 2011; accepted 26 November 2011; published online 20 December 2011)

High-resolution patterning of nanostructured materials into open templates is limited by the processes of creation and removal of the necessary template. In this work, a process for forming a micropatterned template from cellulose acetate polymer in situ on the substrate is demonstrated. Nanoparticles are patterned by evaporative self-assembly, and the template is removed by mechanical means. The process is demonstrated by patterning zinc oxide nanoparticles on silicon and cyclic olefin copolymer substrates and by creating a highly sensitive ultraviolet light detector.

© 2011 American Institute of Physics

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KEYWORDS and PACS

Keywords

II-VI semiconductors, nanofabrication, nanoparticles, nanopatterning, self-assembly, semiconductor growth, wide band gap semiconductors, zinc compounds

PACS

  • 81.16.Rf

    Micro- and nanoscale pattern formation

  • 81.16.Dn

    Self-assembly

  • 81.07.Bc

    Nanocrystalline materials

  • 81.05.Dz

    II-VI semiconductors

  • 61.46.Df

    Structure of nanocrystals and nanoparticles ("colloidal" quantum dots but not gate-isolated embedded quantum dots)

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3671084

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    M. Harting, J. Zhang, D. R. Gamota, and D. T. Britton, Appl. Phys. Lett. 94, 193509 (2009)APPLAB000094000019193509000001.


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