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Applied Physics Letters / Volume 99 / Issue 26 / PLASMAS AND ELECTRICAL DISCHARGES

Appl. Phys. Lett. 99, 261503 (2011); http://dx.doi.org/10.1063/1.3672814 (3 pages)

Intense terahertz emission from atomic cluster plasma produced by intense femtosecond laser pulses

Fazel Jahangiri1, Masaki Hashida1, Takeshi Nagashima2, Shigeki Tokita1, Masanori Hangyo2, and Shuji Sakabe1

1Advanced Research Center for Beam Science, ICR, Kyoto University, Gokasho, Uji, Kyoto 611-0011, Japan and Department of Physics, GSS, Kyoto University, Kitashirakawa, Sakyo, Kyoto 606-7501, Japan
2Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka, Suita, Osaka 565-0871, Japan

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(Received 7 October 2011; accepted 6 December 2011; published online 28 December 2011)

Terahertz (THz) emission from argon cluster plasma, generated by intense femtosecond laser pulses in the energy range of 10–70 mJ, has been investigated. THz polarization, energy dependence, and angular distribution were measured to provide an initial discussion on the mechanisms of THz emission. THz pulses of much higher energy were generated from argon clusters than from argon gas, which indicates that plasma produced from atomic clusters holds considerable promise as an intense THz source.

© 2011 American Institute of Physics

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KEYWORDS and PACS

Keywords

argon, atomic clusters, plasma diagnostics, plasma light propagation, plasma sources

PACS

  • 52.25.Os

    Emission, absorption, and scattering of electromagnetic radiation

  • 52.70.Kz

    Optical (ultraviolet, visible, infrared) measurements

  • 52.38.Dx

    Laser light absorption in plasmas (collisional, parametric, etc.)

  • 52.50.Dg

    Plasma sources

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3672814

PUBLICATION DATA

ISSN

0003-6951 (print)  
1077-3118 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
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    M. Beresna, P. G. Kazansky, Y. Svirko, M. Barkauskas, and R. Danielius, Appl. Phys. Lett. 95, 121502 (2009)APPLAB000095000012121502000001.


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