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18 Jul 2011

Volume 99, Issue 3, Articles (03xxxx)

Issue Cover Spotlight Figure

Appl. Phys. Lett. 99, 032501 (2011); http://dx.doi.org/10.1063/1.3610947 (3 pages)

G. X. Miao, M. D. Mascaro, C. H. Nam, C. A. Ross, and J. S. Moodera
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Size-sensitive sorting of microparticles through control of flow geometry

Cheng Wang, Shreyas V. Jalikop, and Sascha Hilgenfeldt

Appl. Phys. Lett. 99, 034101 (2011); http://dx.doi.org/10.1063/1.3610940 (3 pages) | Cited 8 times

Online Publication Date: 18 July 2011

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We demonstrate a general concept of flow manipulation in microfluidic environments, based on controlling the shape and position of flow domains in order to force switching and sorting of microparticles without moving parts or changes in design geometry. Using microbubble acoustic streaming, we show that regulation of the relative strength of streaming and a superimposed Poiseuille flow allows for size-selective trapping and releasing of particles, with particle size sensitivity much greater than what is imposed by the length scales of microfabrication. A simple criterion allows for quantitative tuning of microfluidic devices for switching and sorting of particles of desired size.
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47.85.L- Flow control
47.55.dd Bubble dynamics
47.61.Jd Multiphase flows

Sequential shrink photolithography for plastic microlens arrays

David Dyer, Samir Shreim, Shreshta Jayadev, Valerie Lew, Elliot Botvinick, and Michelle Khine

Appl. Phys. Lett. 99, 034102 (2011); http://dx.doi.org/10.1063/1.3609322 (3 pages) | Cited 2 times

Online Publication Date: 19 July 2011

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Endeavoring to push the boundaries of microfabrication with shrinkable polymers, we have developed a sequential shrink photolithography process. We demonstrate the utility of this approach by rapidly fabricating plastic microlens arrays. First, we create a mask out of the children’s toy Shrinky Dinks by simply printing dots using a standard desktop printer. Upon retraction of this pre-stressed thermoplastic sheet, the dots shrink to a fraction of their original size, which we then lithographically transfer onto photoresist-coated commodity shrink wrap film. This shrink film reduces in area by 95% when briefly heated, creating smooth convex photoresist bumps down to 30 µm. Taken together, this sequential shrink process provides a complete process to create microlenses, with an almost 99% reduction in area from the original pattern size. Finally, with a lithography molding step, we emboss these bumps into optical grade plastics such as cyclic olefin copolymer for functional microlens arrays.
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42.79.Bh Lenses, prisms and mirrors
42.82.Cr Fabrication techniques; lithography, pattern transfer
81.16.Nd Micro- and nanolithography
81.10.Fq Growth from melts; zone melting and refining
42.70.Jk Polymers and organics

A low emittance and high efficiency visible light photocathode for high brightness accelerator-based X-ray light sources

T. Vecchione, I. Ben-Zvi, D. H. Dowell, J. Feng, T. Rao, J. Smedley, W. Wan, and H. A. Padmore

Appl. Phys. Lett. 99, 034103 (2011); http://dx.doi.org/10.1063/1.3612916 (3 pages) | Cited 4 times

Online Publication Date: 21 July 2011

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Free-electron lasers and energy recovery linacs represent a new generation of ultra-high brightness electron accelerator based x-ray sources. Photocathodes are a critical performance-limiting component of these systems. Here, we describe the development of photocathodes based on potassium-cesium-antimonide that satisfy many of the key requirements of future light sources, such as robustness, high quantum efficiency when excited with visible light, and low transverse emittance.
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85.60.Ha Photomultipliers; phototubes and photocathodes
41.60.Cr Free-electron lasers
29.20.Ej Linear accelerators

Capillary-driven self-assembly of microchips on oleophilic/oleophobic patterned surface using adhesive droplet in ambient air

Bo Chang, Veikko Sariola, Susanna Aura, Robin H. A. Ras, Maria Klonner, Harri Lipsanen, and Quan Zhou

Appl. Phys. Lett. 99, 034104 (2011); http://dx.doi.org/10.1063/1.3615053 (3 pages) | Cited 7 times

Online Publication Date: 22 July 2011

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This letter describes a capillary-driven self-assembly technique using oleophilic/oleophobic patterned surface and adhesive in ambient air environment. We use a topographical microstructure of porous ormocer functionalized with a fluorinated trichlorosilane for the oleophobic area and gold patterns for the oleophilic area. The resulted oleophilic/oleophobic patterns show significant wettability contrast for adhesive (Delo 18507), with a contact angle of 119° on oleophobic part and 53° on the oleophilic part. Self-alignment of SU-8 microchips on the oleophilic/oleophobic patterns has been demonstrated. The results provide a promising solution for self-alignment of microparts using commercial adhesives in ambient air environment.
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68.08.Bc Wetting
68.03.Cd Surface tension and related phenomena
61.43.Gt Powders, porous materials

On-chip silicon-based active photonic molecules by complete photonic bandgap light confinement

Bo Qian, Kunji Chen, San Chen, Wei Li, Xiangao Zhang, Jun Xu, Xinfan Huang, Lorenzo Pavesi, and Chunping Jiang

Appl. Phys. Lett. 99, 034105 (2011); http://dx.doi.org/10.1063/1.3614548 (3 pages)

Online Publication Date: 22 July 2011

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We demonstrate an on-chip silicon-based active photonic molecule (PM) structures formed by two coupled photonic quantum dots with complete photonic bandgap (PBG) light confinement. The photonic quantum dots are grown by conformal deposition of amorphous silicon nitride multilayers on patterned substrates. A fine structure of the coupled optical modes in PMs has been observed which shows similarity to the electronic bonding (BN) and antibonding (ABN) states in a molecule.
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42.82.-m Integrated optics
78.67.Pt Multilayers; superlattices; photonic structures; metamaterials
42.50.-p Quantum optics
42.70.Qs Photonic bandgap materials
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