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RH 153511

The Origin of Broad Distribution of Breakdown Times in Polycrystalline Thin Film Dielectrics

Muhammad Masuduzzaman, Sujing Xie, Jayhoon Chung, Dhanoop Varghese, John Rodriguez, Srikanth Krishnan, and Muhammad Ashraful Alam

This letter explores the physical origin of this anomalously broad failure time distribution in polycrystalline films, and confirm that pre-existing defects, play a crucial role in broadening the distribution of failure times. An analytical formulation is also presented by extending the classical percolation model to interpret the experiments.

Appl. Phys. Lett. 101, 153511 (2012) | HTML | PDF

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